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|Statement||James S. Sovey and Michael J. Patterson.|
|Series||NASA technical memorandum -- 105145.|
|Contributions||Patterson, Michael J., 1955-, United States. National Aeronautics and Space Administration.|
|The Physical Object|
Download Ion beam sputtering in electric propulsion facilities
Add to Book Bag Remove from Book Bag. Ion beam sputtering in electric propulsion facilities. Saved in: Main Author: Sovey, James S. Other Authors: Patterson, Michael J.,United States.
National Aeronautics and Space Administration. One dimensional heavy ion beam transport energy independent model / by. Ion beam sputtering in electric propulsion facilities.
July ; DOI: / Source; to assess the impact of charge exchange on beam diagnostics in large facilities, and to. Get this from a library. Ion beam sputtering in electric propulsion facilities.
[James S Sovey; Michael J Patterson; United States. National Aeronautics and Space Administration.]. Journal of Propulsion and Power; Browse All Journals; Browse All Virtual Collections; Books. AIAA Education Series; Library of Flight; Progress in Astronautics and Aeronautics; The Aerospace Press; Browse All Books; Joint Propulsion Conferences Home; No Access.
Ion beam sputtering in electric propulsion facilities. NASA Technical Reports Server (NTRS) Ion beam sputtering in electric propulsion facilities Item Preview.
The text also considers a number of experiments, including the space-charge theory for ion beams, circular beam neutralization, and transient and steady state behavior in cesium ion beams. The book is a good source of information for readers wanting to study electrostatic propulsion. The 32nd International Electric Propulsion Conference, Wiesbaden, Germany September 11 – 15, 1 Effect of Ion Sputtering on Transmission of Coverglass with Magnesium Fluoride Coating IEPC Presented at the 32nd International Electric Propulsion Conference, given ion beam conditions) using a simple circuit.
(Note that the test. Buy Ion beam sputtering in electric propulsion facilities (SuDoc NAS ) by Sovey, James S. (ISBN:) from Amazon's Book Store. Everyday low prices and free delivery on eligible : James S. Sovey. Fundamentals of Electric Propulsion: Ion and Hall Thrusters March The research described in this publication was carried out at the Jet Propulsion Laboratory, California Institute of Technology, under a contract with the National Aeronautics and Space Administration.
Reference herein to any specific commercial product, process, or service. The back-sputtering deposition on thruster surface caused by ion bombardment on chamber wall material affects the performance of thrusters during the ground based electric propulsion endurance tests. In order to decrease the back-sputtering deposition, most of vacuum chambers applied in electric propulsion experiments are equipped with anti.
The ion thruster’s main feature is that the propellant ionization process and the ion acceleration process are physically separated, contrary to other electric thrusters such as hall thrusters.1, 2 The ionization process takes place in the discharge chamber of the thruster and can be achieved by different principles, 13 namely electron.
ET). This electric propulsion test facility has now accumulated several years of EP-thruster testing experience. Special features tailored to electric space propulsion testing like a large vacuum chamber mounted on a low vibration foundation, a beam dump target made of low sputtering material, and a performant pumping system characterize this.
Throughout most of the twentieth century, electric propulsion was considered the technology of the future. Now, the future has arrived. This important new book explains the fundamentals of electric propulsion for spacecraft and describes in detail the physics and characteristics of the two major electric thrusters in use today, ion and Hall thrusters.5/5(1).
A survey of low energy xenon ion impact sputter yields was conducted to provide a more coherent baseline set of sputter yield data and accompanying fits for electric propulsion integration.
Data uncertainties are discussed and different available curve fit. Journal of Propulsion and Power; Browse All Journals; Browse All Virtual Collections; Books. AIAA Education Series; Library of Flight; Progress in Astronautics and Aeronautics; The Aerospace Press For Authors ; International Electric Propulsion Conference Home; No Access.
Ion beam sputtering of liquid metals. GARVIN; H. GARVIN. Special features tailored to electric space propulsion testing like a large vacuum chamber mounted on a low vibration foundation, a beam dump target with low sputtering, and a performant pumping.
Abstract jbi beam ion current density, A/m2 k Boltzmann's constant (MKS) While the potential problems of spacecraft me,i electron, ion mass, kg contamination by the effluents of electric nbi beam ion density, m-3 propulsion thrusters have been known for nie.n total ion, electron, neutral density, m developed from electric propulsion technology, uses.
argon gas ina hollow cathode inthe main discharge. chamber as well as for the neutralizer. The ion. source iscapable of operation at ion beam energy. levels between and eV. For these studies. the source was operated so as to produce a eV.
ion beam. The vacuum facility, m in. The back-sputtering deposition on thruster surface caused by ion bombardment on chamber wall material affects the performance of thrusters during the ground based electric propulsion endurance tests. In order to decrease the back-sputtering deposition, most of vacuum chambers applied in electric propulsion experiments are equipped with anti-sputtering targets.
Brieda, and J. Wang, “Modeling Ion Thruster Beam Neutralization Using a Fully Kinetic ES-PIC Code,” 41st Joint Propulsion Conference, Tucson, AZ, JulyAIAA L.
Brieda, J. Pierru, R. Kafafy, and J. Wang, “Development of the Draco Code for Modeling Electric Propulsion Plume Interactions,” 40th Joint Propulsion Conference. Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates.
The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attracti. Ion beam application, etching, or sputtering, is a technique conceptually similar to sandblasting, but using individual atoms in an ion beam to ablate a target.
Reactive ion etching is an important extension that uses chemical reactivity to enhance the physical sputtering effect. In general, an ion beam source consists of the ionizer, in which the ions are generated, and of an electrode system for ion extraction, acceleration and focusing.
If a beam of fast neutrals is needed, each ion must be neutralized by charge exchange. If the beam should be neutralized, electrons must be mixed with the ions 1.
Ion beam sputtering (IBS) View IBS Model or click image below: IBS coatings are produced in a vacuum chamber. In IBS, a high energy ion beam is directed at a target, typically composed of a metal or oxide. The ions transfer their momentum to the target material, causing atoms or molecules to sputter off.
A detailed technological description of a novel filamentless rf-ion source suitable for generating broad ion beams of inert and reactive species is presented.
Emphasis is placed also on a novel compact low energy hybrid ion extraction optics, as well as an alternating ion and electron extraction concept for beam neutralization.
A novel probe for the measurement of forces exerted by a beam of ions and neutral atoms on a small target is described. The force probe is intended for various applications: First, diagnostics of thruster plumes of electric spacecraft propulsion engines, in particular the determination of the spatial distribution of the momentum in an exhaust beam, and second, the study of sputtering.
Colorado State University Electric Propulsion & Plasma Engineering (CEPPE) Laboratory. The CEPPE Laboratory researches ion and hall thrusters, plasma propulsion technologies, and spacecraft propulsion systems as well as other applications of plasma technology including hydroxyapatite thin films, erosion and sputtering problems, ion optics, and computational modeling.
Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressive stress, which results in severe wavefront deformation of optical elements. Annealing post-treatment has been widely used to control the residual stress of optical coatings. However, the effect of annealing on the stress of Ta2O5 films deposited by the IBS method has not been reported in detail.
Ion Beam Sputtering (IBS), also called Ion Beam Deposition (IBD), is a thin film deposition process that uses an ion source to deposit or sputter a target material (metal or dielectric) onto a substrate to create either a metallic or dielectric film.
Because the ion beam is monoenergetic (ions possess the equal energy) and highly collimated, it enables extremely precise thickness control and. The ion propulsion system's efficient use of fuel and electrical power enable modern spacecraft to travel farther, faster and cheaper than any other propulsion technology currently available.
Chemical rockets have demonstrated fuel efficiencies up to 35 percent, but ion thrusters have demonstrated fuel efficiencies over 90 percent. Matlock T S, Dodson C A, Goebel D M and Wirz R E Measurements of transport due to low frequency 34th Int.
Electric Propulsion Conf. pp 1–10  Som T and Kanjilal D Nanofabrication by Ion-Beam Sputtering: Fundamentals and Applications (Boca Raton, FL: CRC Press) pp. The 30th International Electric Propulsion Conference, Florence, Italy September2 modules to the low altitude orbits of the Moon and Mars needed for human exploration, or even for an advanced human Mars mission itself In the space propulsion field, the concept has been verified during an experimental programme at ESTEC2, in which potentials as high as 30 kV were employed.
End-point detection for ion beam sputtering with continuous wave cavity ring-down spectroscopy Ion beam sputtering (etching) is a preferred method for the manufacture of multilayer structures and coatings for a variety of applications, including dielectric mirrors, thin film heads (TFHs) for data storage, and photovoltaic materials.
The low-energy sputtering of boron nitride, magnesium oxide, boron nitride and aluminum nitride (BNAlN), and boron nitride and silicon oxide (BNSiO 2) by xenon ions of bombarding energieseV, and 1 keV was studied experimentally. In order to measure the ion current without being significantly disturbed by slow ions, only planar probes were used during short duration sputtering.
Sputter-resistant materials have immediate application in NASA ground test facilities devoted to life testing high current, high voltage electric propulsion thrusters. POTENTIAL NON-NASA APPLICATION(S) (LIMIT WORDS) Sputter-resistant materials have broad applications where ion sources are used.
Ion Beam Sputtering System System A. Process Chamber B. Primary Ion Beam Source (RF ion source - Oxford) C. Secondary Ion Beam Source (Assist source - Kaufman) D.
Residual Gas Analyzer (RGA) E. Substrate Motor Controller F. Mass Flow Controllers (MFC) G. RF Atom Source H. Ion drives are a subfield of the larger electric propulsion device group. In a nutshell, ion drives work by ionizing a gaseous fuel such as Xenon and then accelerating it in an electric field and ejecting it out the back of the spaceship.
Magnetic shielding of ion beam thruster walls 13 February Electric rocket engines known as Hall thrusters, which use a super high-velocity stream of ions to.
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment.
Sputtered atoms ejected from the target have a wide energy distribution. Current work is focused on characterization of the ion beam (with various facility diagnostics and electrostatic modeling) throughout the facility and at the entrance of the Test Cell.
Electron emission from plasma-confining materials due to ion impact are investigated by modifying the test cell to hold the target material in the beam’s line. Ionic Liquid Ion Source Development Ionic Liquid Ion Sources (ILIS) consist of an electrochemically-sharpened tungsten needle, which is covered in an organic ionic liquid.
By applying an electric potential between the needle and a downstream metallic extractor, a structure known as a Taylor cone is formed at the tip of the needle.Vacuum Facility 1 (VF-1) Description.
Measures m diameter by m long. Two test ports located at opposite ends of chamber used for ion-beam sputter deposition of various coatings (including diamond-like carbon, doped metal-oxide, and molecular glass-polymer mixture films).
[Power & Electric Propulsion Division].Used for single or dual ion beam deposition of diamond like carbon films and ion beam texturing and sputtering of materials. Features: Vacuum pumping system provides large gas throughput that provides low operating pressures.
3x Torr base pressure (no load). m diameter by m long vacuum chamber with multiple test ports.